HomeSearchJournal of Vacuum Science and Technology B

Journal of Vacuum Science and Technology B

AVS Science and Technology Society · United States · Est. 2010

ISSN2166-2746eISSN2166-2754
SJR Q3WOS SCIEScopus / SJR
47
/ 100
Medium Risk
Score Breakdown
WoS SCIE/SSCI+25
Scopus Q3+12
Total47
Journal Impact Factor
This journal is indexed in Web of Science (JCR) and has an official Journal Impact Factor. View the current value on the journal’s page ↗
SJR Score
0.28
H-Index
62
CiteScore
View ↗
Scopus metric · on the journal’s page
SNIP
0.669
Total Works
4,367
Total Citations
45,602
2yr Mean Citedness
1.71
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Aims & Scope✦ Inferred from recent articles

This journal focuses on the science and technology of vacuum and surface phenomena, with applications in materials science, semiconductor manufacturing, and device fabrication. Recent articles explore advanced materials processing, including plasma etching, thin film deposition, and surface modification for applications such as batteries, transistors, and sensors. The journal also covers the development and characterization of novel electron and ion sources, as well as advanced imaging and analysis techniques for nanoscale structures.

AI-summarised from recent articles · verify on publisher page →

⚡ Speed vs Prestige
How does this journal balance review speed with impact level?
Q3
SJR Rank
Top 75% in field

General Information

Country / RegionUnited States
Primary LanguageEnglish
1st Year Published2010
FrequencyBimonthly
StatusActive (last: 2026)
Total Publications4,367
Visit Journal Website

Submission Info

Peer ReviewPeer-reviewed
Review Time
Acceptance Rate
OA License
OA Rate

Ethics & Quality

COPE Member✗ No
OASPA Member✗ No
Not on Predatory Lists✓ Yes

Think.Check.Submit Compliance

7/12 · 58%
Do you know the journal / publisher?
AVS Science and Technology Society
Does the journal have a website?
✓ Linked
Is the ISSN verified?
2166-2746 / 2166-2754
Indexed in a trusted database?
WoS, Scopus
Peer review process documented?
Peer-reviewed
Follows ethical publishing standards (COPE)?
N/A
APC fees clearly disclosed?
N/A
Not on predatory/blacklists?
✓ Clean
Long-term digital preservation?
N/A
Plagiarism detection in place?
N/A
Listed in DOAJ (verified OA)?
N/A
Primary language documented?
English

Based on the Think.Check.Submit framework by DOAJ, COPE & OASPA. All data from verified open sources.

Publication & Citation Trend

Articles published
Times cited
2019
2020
2021
2022
2023
2024
2025
2026

Source: OpenAlex · Note: citations accumulate over time so older years appear higher

SJR Quartile by Discipline

Scimago ranks this journal separately in each subject category — its quartile can differ by discipline.

Condensed Matter PhysicsQ3
Electrical and Electronic EngineeringQ3
Electronic, Optical and Magnetic MaterialsQ3
InstrumentationQ3
Materials ChemistryQ3
Process Chemistry and TechnologyQ3
Surfaces, Coatings and FilmsQ3

Subject Classification

Web of Science Categories

Engineering, Electrical & ElectronicNanoscience & NanotechnologyPhysics, Applied

Scopus Categories

Condensed Matter PhysicsProcess Chemistry and TechnologyElectrical and Electronic EngineeringInstrumentationSurfaces, Coatings and FilmsElectronic, Optical and Magnetic MaterialsMaterials Chemistry

Research Topics (OpenAlex)

Semiconductor materials and devicesAdvancements in Photolithography TechniquesIntegrated Circuits and Semiconductor Failure AnalysisGaN-based semiconductor devices and materialsNanofabrication and Lithography TechniquesZnO doping and propertiesIon-surface interactions and analysisNanowire Synthesis and ApplicationsSemiconductor Quantum Structures and DevicesAdvancements in Semiconductor Devices and Circuit Design
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Data updated: 2026-05-22 · Sources: SJR, DOAJ, OpenAlex, WoS, Crossref