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Journal of Vacuum Science and Technology B

AVS Science and Technology Society · United States · Est. 2010

ISSN2166-2746eISSN2166-2754

SJR Q3✓ WOS SCIE✓ Scopus / SJR

/ 100

High Trust

PubScope credibility score from verifiable indexing & ethics signals

Score Breakdown

◆ WoS flagship (SCIE/SSCI/AHCI)78

✓ Corroboration (3 more)+18

Total96

Level data: Norwegian Register (HK-dir), NLOD 2.0. · Third-party records · how this is calculated · Report an error →

⚡ Speed vs Prestige

How does this journal balance review speed with impact level?

Publication speed: not measurable

publisher doesn’t disclose per-article submission dates — we never estimate

SJR Rank

Top 75% in field

Impact Factor & Quartile · Web of Science (JCR)

✓ Indexed in the Web of Science Core Collection (SCIE) — Clarivate publishes an official Journal Impact Factor and JCR quartile for this journal.

See the official Impact Factor & quartile on the journal’s page ↗

The Impact Factor & JCR quartile are licensed by Clarivate — we link you to the official source instead of reprinting a number that can go out of date. Open metrics below: SCImago Q3. Source: Clarivate Journal Citation Reports.

SJR Scorei

0.359

H-Indexi

CiteScore

View ↗

Scopus metric · on the journal’s page

SNIPi

0.669

Total Worksi

4,367

Total Citationsi

45,602

2yr Mean Citednessi

1.71

Open Impact Factor alternative

Aims & Scope

Subject areas: Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Physics, Applied; Condensed Matter Physics; Electrical and Electronic Engineering; Electronic, Optical and Magnetic Materials; Instrumentation; Materials Chemistry; Process Chemistry and Technology; Surfaces, Coatings and Films.

General Information

Country / RegionUnited States

Primary LanguageEnglish

1st Year Published2010

FrequencyBimonthly

StatusActive (last: 2026)

Total Publications4,367

Visit Journal Website

Submission Info

Peer ReviewPeer-reviewed

Review Time—

Acceptance Rate—

OA License—

OA Rate—

Ethics & Quality

COPE Member✗ No

OASPA Member✗ No

Not on Predatory Lists✓ Yes

Think.Check.Submit Compliance

thinkchecksubmit.org

7/12 · 58%

✅

Do you know the journal / publisher?

AVS Science and Technology Society

✅

Does the journal have a website?

✓ Linked

✅

Is the ISSN verified?

2166-2746 / 2166-2754

✅

Indexed in a trusted database?

WoS, Scopus, PubMed

✅

Peer review process documented?

Peer-reviewed

❌

Follows ethical publishing standards (COPE)?

N/A

❌

APC fees clearly disclosed?

N/A

✅

Not on predatory/blacklists?

✓ Clean

❌

Long-term digital preservation?

N/A

❌

Plagiarism detection in place?

N/A

❌

Listed in DOAJ (verified OA)?

N/A

✅

Primary language documented?

English

Based on the Think.Check.Submit framework by DOAJ, COPE & OASPA. All data from verified open sources.

Publication & Citation Trend

Articles published

Citations received

244

2.5k

2019

200

1.6k

2020

155

946

2021

161

839

2022

190

680

2023

187

670

2024

183

172

2025

2026

Source: OpenAlex · Each year’s green bar = citations earned by that year’s papers, counted to date — so recent years look lower simply because their papers haven’t had time to be cited yet.

SJR Quartile by Discipline

Scimago ranks this journal separately in each subject category — its quartile can differ by discipline.

Condensed Matter PhysicsQ3

Electrical and Electronic EngineeringQ3

Electronic, Optical and Magnetic MaterialsQ3

InstrumentationQ3

Materials ChemistryQ3

Process Chemistry and TechnologyQ3

Surfaces, Coatings and FilmsQ3

Subject Classification

Web of Science Categories

Engineering, Electrical & ElectronicNanoscience & NanotechnologyPhysics, Applied

Scopus Categories

Condensed Matter PhysicsProcess Chemistry and TechnologyElectrical and Electronic EngineeringInstrumentationSurfaces, Coatings and FilmsElectronic, Optical and Magnetic MaterialsMaterials Chemistry

Research Topics (OpenAlex)

Semiconductor materials and devicesAdvancements in Photolithography TechniquesIntegrated Circuits and Semiconductor Failure AnalysisGaN-based semiconductor devices and materialsNanofabrication and Lithography TechniquesZnO doping and propertiesIon-surface interactions and analysisNanowire Synthesis and ApplicationsSemiconductor Quantum Structures and DevicesAdvancements in Semiconductor Devices and Circuit Design

Frequently asked questions about Journal of Vacuum Science and Technology B

Is Journal of Vacuum Science and Technology B a predatory journal?

PubScope has no integrity flags on record for Journal of Vacuum Science and Technology B: it is indexed in Web of Science, Scopus, and is not on DOAJ's withdrawn list. Its PubScope Trust Score is 96/100. Indexing is a transparency signal, not a guarantee — always confirm fit and policies before submitting.

What is the impact factor of Journal of Vacuum Science and Technology B?

Journal of Vacuum Science and Technology B is indexed in the Web of Science Core Collection, so Clarivate publishes an official Journal Impact Factor for it (since the 2023 Journal Citation Reports, every Core Collection journal — including Arts & Humanities and Emerging Sources titles — receives one). PubScope links to Clarivate's official source rather than reprinting the number, which can be out of date. Its open 2-year mean citedness is 1.71.

Is Journal of Vacuum Science and Technology B indexed in Scopus and Web of Science?

Journal of Vacuum Science and Technology B is indexed in Web of Science, Scopus.