HomeSearchJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS · US · Est. 2002

ISSN1932-5150eISSN2708-8340
WOS SCIE
25
/ 100
High Risk
Score Breakdown
WoS SCIE/SSCI+25
Total25
Journal Impact Factor
This journal is indexed in Web of Science (JCR) and has an official Journal Impact Factor. View on Clarivate Master Journal List ↗
H-Index
48
Total Works
1,675
Total Citations
17,486
2yr Mean Citedness
0.00
Free JIF alternative

Aims & Scope✦ Inferred from recent articles

The JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 focuses on core enabling technologies for the electronics industry, particularly in the area of micro- and nanopatterning. Recent articles address advanced lithography techniques like extreme ultraviolet (EUV) lithography, including illumination strategies, mask absorber materials, and spectral purity. The journal also covers metrology for characterizing nanoscale features, such as line edge roughness (LER) and sidewall roughness (SWR), using techniques like scanning electron microscopy (SEM) and atomic force microscopy (AFM). Additionally, it explores materials and fabrication methods for microfluidics and microelectromechanical systems (MEMS), as well as defect detection and analysis in semiconductor manufacturing.

AI-summarised from recent articles · verify on the publisher page

General Information

Country / RegionUS
Primary LanguageEnglish
1st Year Published2002
Status⚠️ Inactive
Total Publications1,675
Publisher OrgSPIE

Submission Info

Peer Review
Review Time
Acceptance Rate
OA License
OA Rate

Ethics & Quality

COPE Member✗ No
OASPA Member✗ No
Not on Predatory Lists✓ Yes

Think.Check.Submit Compliance

5/12 · 42%
Do you know the journal / publisher?
SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
Does the journal have a website?
No URL
Is the ISSN verified?
1932-5150 / 2708-8340
Indexed in a trusted database?
WoS
Peer review process documented?
N/A
Follows ethical publishing standards (COPE)?
N/A
APC fees clearly disclosed?
N/A
Not on predatory/blacklists?
✓ Clean
Long-term digital preservation?
N/A
Plagiarism detection in place?
N/A
Listed in DOAJ (verified OA)?
N/A
Primary language documented?
English

Based on the Think.Check.Submit framework by DOAJ, COPE & OASPA. All data from verified open sources.

Subject Classification

Web of Science Categories

Engineering, Electrical & ElectronicMaterials Science, MultidisciplinaryNanoscience & NanotechnologyOptics

Research Topics (OpenAlex)

Advancements in Photolithography TechniquesNanofabrication and Lithography TechniquesIntegrated Circuits and Semiconductor Failure AnalysisOptical Coatings and GratingsElectron and X-Ray Spectroscopy TechniquesAdvanced MEMS and NEMS TechnologiesAdvanced Surface Polishing TechniquesPhotonic and Optical DevicesMechanical and Optical ResonatorsForce Microscopy Techniques and Applications
Compare This JournalFind Similar← Back to Search

Data updated: 2026-05-26 · Sources: SJR, DOAJ, OpenAlex, WoS, Crossref