JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS · US · Est. 2002
Aims & Scope✦ Inferred from recent articles
The JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 focuses on core enabling technologies for the electronics industry, particularly in the area of micro- and nanopatterning. Recent articles address advanced lithography techniques like extreme ultraviolet (EUV) lithography, including illumination strategies, mask absorber materials, and spectral purity. The journal also covers metrology for characterizing nanoscale features, such as line edge roughness (LER) and sidewall roughness (SWR), using techniques like scanning electron microscopy (SEM) and atomic force microscopy (AFM). Additionally, it explores materials and fabrication methods for microfluidics and microelectromechanical systems (MEMS), as well as defect detection and analysis in semiconductor manufacturing.
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